Shallow trench isolation trenches and methods for NAND memory

ABSTRACT

A NAND memory is provided that includes a memory cell region and a peripheral region. The peripheral region includes a shallow trench isolation trench disposed in a substrate. The shallow trench isolation trench includes a first top surface, and a second top surface. A difference between a height of the second top surface and a height of the first top surface is less than a predetermined value Δ MAX .

This application is a divisional of U.S. patent application Ser. No. 14/831,754 entitled “SHALLOW TRENCH ISOLATION TRENCHES AND METHODS FOR NAND MEMORY,” filed Aug. 20, 2015, which is incorporated by reference herein in its entirety for all purposes.

BACKGROUND

Embodiments of the present disclosure are directed to high density semiconductor devices, such as non-volatile memory, and methods of forming the same.

In most integrated circuit applications, the substrate area allocated to implement the various integrated circuit functions continues to decrease. Semiconductor memory devices, for example, and their fabrication processes are continuously evolving to meet demands for increases in the amount of data that can be stored in a given area of the silicon substrate. These demands seek to increase the storage capacity of a given size of memory card or other type of package and/or decrease their size.

Electrical Erasable Programmable Read Only Memory (EEPROM), including flash EEPROM, and Electronically Programmable Read Only Memory (EPROM) are among the most popular non-volatile semiconductor memories. One popular flash EEPROM architecture utilizes a NAND array having a large number of strings of memory cells connected through one or more select transistors between individual bit lines and common source lines. FIG. 1 is a top view showing a single NAND string and FIG. 2 is an equivalent circuit thereof.

The NAND string depicted in FIGS. 1 and 2 includes four transistors 100, 102, 104 and 106 in series between a first select gate 120 and a second select gate 122. Select gate 120 connects the NAND string to a bit line via bit line contact 126. Select gate 122 connects the NAND string to a common source line via source line contact 128. Each of the transistors 100, 102, 104 and 106 is an individual storage element and includes a control gate and a floating gate.

For example, transistor 100 includes control gate 100CG and floating gate 100FG, transistor 102 includes control gate 102CG and floating gate 102FG, transistor 104 includes control gate 104CG and floating gate 104FG, and transistor 106 includes control gate 106CG and floating gate 106FG. Control gate 100CG is connected to word line WL3, control gate 102CG is connected to word line WL2, control gate 104CG is connected to word line WL1, and control gate 106CG is connected to word line WL0.

Note that although FIGS. 1 and 2 show four memory cells in the NAND string, the use of four transistors is only provided as an example. A NAND string can have less than four memory cells or more than four memory cells. For example, some NAND strings will include eight memory cells, 16 memory cells, 32 memory cells, or more.

The charge storage elements of current flash EEPROM arrays are most commonly electrically conductive floating gates, typically formed from a doped polysilicon material, or a double floating gate stack that includes a polysilicon material (doped or undoped) and a metal layer, with a dielectric material separating the metal and polysilicon material layers. Other types of memory cells in flash EEPROM systems can utilize a non-conductive dielectric material in place of a conductive floating gate to form a charge storage element capable of storing charge in a non-volatile manner.

As demands for higher densities in integrated circuit applications have increased, fabrication processes have evolved to reduce the minimum feature sizes of circuit elements such as the gate and channel regions of transistors. Existing fabrication techniques, however, may not be sufficient to fabricate integrated devices these devices.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a top view of a NAND string.

FIG. 2 is an equivalent circuit diagram of the NAND string depicted in FIG. 1.

FIG. 3 is a plan view of a portion of a NAND flash memory array.

FIG. 4 is an orthogonal cross-sectional view taken along line A-A of the portion of the flash memory array depicted in FIG. 3.

FIG. 5 is a three-dimensional drawing of a pair of four word line long portions of two NAND strings.

FIG. 6A is a cross-sectional view of a portion of a peripheral region of a flash memory device.

FIGS. 6B and 6C are expanded views of portions of the cross-sectional view of FIG. 6A.

FIGS. 7A-7R are cross-sectional views of a portion of a substrate during an example fabrication of a peripheral region of a flash memory device.

FIGS. 8A-8P2 are cross-sectional views of a portion of a substrate during another example fabrication of a peripheral region of a flash memory device.

FIG. 9 is a block diagram depicting an example of a memory system.

DETAILED DESCRIPTION

A NAND memory is provided that includes a memory cell region and a peripheral region. The peripheral region includes a shallow trench isolation trench disposed in a substrate. The shallow trench isolation trench includes a first top surface, and a second top surface. A difference between a height of the second top surface and a height of the first top surface is less than a predetermined value Δ_(MAX).

Without wanting to be bound by any particular theory, it is believed that making a difference between a height of the second top surface and the height of first top surface less than a predetermined value Δ_(MAX) may prevent gouging of an active area portion of a peripheral transistor region of the substrate, and may prevent polysilicon residue forming as a result of under-etching of a capacitor bottom plate material.

An example of a type of memory system that can be fabricated in accordance with one embodiment is shown in plan view in FIG. 3. BL0-BL4 represent bit line connections to global vertical metal bit lines (not shown). Four floating gate memory cells are shown in each string by way of example. Typically, the individual strings include 16, 32 or more memory cells, forming a column of memory cells. Control gate (word) lines labeled WL0-WL3 extend across multiple strings over rows of floating gates, often in polysilicon or other conductive material, such as tungsten/tungsten nitride or other conductive material.

FIG. 4 is a cross-sectional view taken along line A-A of FIG. 3, depicting layer P2 from which the control gate lines are formed. The control gate lines are typically formed over the floating gates as a self-aligned stack, and are capacitively coupled to the floating gates through an intermediate dielectric layer 162. The top and bottom of the string connect to a bit line and a common source line through select transistors (gates) 170 and 172, respectively. Gate 170 is controlled by selection line DSL and gate 172 is controlled by selection line SSL.

In some embodiments, the floating gate material (P1) optionally can be shorted to the control gate for the select transistors to be used as the active gate. Capacitive coupling between the floating gate and the control gate allows the voltage of the floating gate to be raised by increasing the voltage on the control gate. An individual cell within a column is read and verified during programming by causing the remaining cells in the string to be turned on hard by placing a relatively high voltage on their respective word lines and by placing a relatively lower voltage on the one selected word line so that the current flowing through each string is primarily dependent only upon the level of charge stored in the addressed cell below the selected word line. That current typically is sensed for a large number of strings in parallel, in order to read charge level states along a row of floating gates in parallel.

FIG. 5 is a three-dimensional block diagram of two exemplary NAND strings 302 and 304 that may be fabricated as part of a larger flash memory array. FIG. 5 depicts four memory cells on strings 302 and 304 as an example. FIG. 5 depicts N-well 326 below P-well 320. The bit line or y-direction runs along the NAND strings, and the word line or x-direction runs perpendicular to the NAND string or the bit line direction. The word line direction may also be referred to as the row direction and the bit line direction referred to as the column direction. The P-type substrate below N-well 326 is not shown in FIG. 5.

In an embodiment, the control gates form the word lines. A continuous layer of conductive layer 336 can be formed which is consistent across a row in order to provide a common word line or control gate for each device on that word line. In such a case, this layer can be considered to form a control gate for each memory cell at the point where the layer overlaps a corresponding floating gate layer 332. Floating gate layer 332 and conductive layer 336 are separated by a dielectric layer 334. In some embodiments, dielectric layer 334 may be a single layer of dielectric material, or may be a multi-layer stack of dielectric materials. In other embodiments, individual control gates can be formed and then interconnected by a separately formed word line.

When fabricating a NAND-type non-volatile memory system, including NAND strings as depicted in FIG. 5, electrical isolation is provided in the word line direction between adjacent strings. In the embodiment depicted in FIG. 5, NAND string 302 is separated from NAND string 304 by isolation area 306.

A flash memory device formed on a silicon substrate may include a memory cell region and a peripheral region. Memory cell transistors of a memory cell array, such as NAND strings 302 and 304 are arranged at the memory cell region, and functional circuits other than the memory cell transistors are arranged at the peripheral region.

Unlike the memory cell region including the memory cell transistors, high voltage and low voltage transistors and/or capacitors may be formed at the peripheral region of a flash memory device. The low voltage transistors may be used to form functional circuits such as a page buffer, a data input/output buffer, and the like.

FIG. 6A illustrates a cross-sectional view during formation of a peripheral region 400 of a flash memory device. In particular, peripheral region 400 includes a substrate 402 which includes a peripheral transistor region 404 and a peripheral capacitor region 406, separated by a dielectric trench 408 (e.g., an SiO₂ shallow trench isolation (STI) trench) formed in substrate 402. At the stage of processing shown in FIG. 6A, peripheral transistor region 404 includes a thin oxide layer 410 a, such as SiO₂, on substrate 402, a doped polysilicon region 412 a on thin oxide region 410 a, a tungsten/tungsten nitride region 414 a on doped polysilicon region 412 a, a dielectric barrier region 416 a, such as silicon nitride, on tungsten/tungsten nitride region 414 a, and dielectric regions 418 a and 420 a (e.g., both SiO₂) on dielectric barrier region 416 a. Tungsten/tungsten nitride region 414 a and doped polysilicon region 412 a are electrically coupled, and act as a gate electrode of transistors formed in peripheral transistor region 404, with thin oxide region 410 a forming a gate oxide of such transistors.

In addition, peripheral capacitor region 406 includes a thin oxide region 410 b, such as SiO₂, on substrate 402, a doped polysilicon region 412 b on thin oxide region 410 a, a first dielectric region 422, such as SiO₂ on doped polysilicon region 412 b, a second dielectric region 424, such as hafnium silicate (HfSiO) on first dielectric region 422, a tungsten/tungsten nitride region 414 b on second dielectric region 424, a dielectric barrier region 416 b, such as silicon nitride, on tungsten/tungsten nitride region 414 b, and dielectric regions 418 b and 420 b (e.g., both SiO₂) on dielectric barrier region 416 b. In some embodiments, tungsten/tungsten nitride region 414 b and doped polysilicon region 412 b are used to form top and bottom electrodes, respectively, of capacitors formed in peripheral capacitor region 406, with first dielectric region 422 and second dielectric region 424 forming the dielectric material sandwiched between the top and bottom electrodes. In other embodiments, doped polysilicon region 412 b and substrate 402 are used to form top and bottom electrodes, respectively, of capacitors formed in peripheral capacitor region 406, with thin oxide region 410 b forming the dielectric material sandwiched between the top and bottom electrodes.

During the processing steps used to form the structure shown in FIG. 6A, portions of the material layers used to form first dielectric region 422 and second dielectric region 424 are etched away from peripheral transistor region 404 to avoid impurity contamination of transistors from precursors, such as carbon or nitrogen for example. As a result of that etching process, STI trench 408 includes a first top surface 426 a and a second top surface 426 b. First top surface 426 a is adjacent peripheral transistor region 404 and second top surface 426 b is adjacent peripheral capacitor region 406, with first top surface 426 a typically lower than second top surface 426 b. Following the etch process, the tungsten/tungsten nitride, silicon nitride and silicon oxide material layers are deposited over substrate 402, and a reactive ion etch (ME) process typically is then used to remove various material layers to form the structure of FIG. 6A.

During the ME process, over-etching of the material layers used to form first dielectric layer 422, second dielectric layer 424 and STI trench 408 may cause exposure of peripheral transistor region 404, and subsequent etching of doped polysilicon regions 412 a and 412 b may cause gouging of an active area portion 428 of the exposed peripheral transistor region 404, shown in more detail in FIG. 6B. As a result of such over-etching, silicon substrate leakage may occur.

In addition, referring again to FIG. 6A, during a subsequent etch of the doped polysilicon layer used to form doped polysilicon regions 412 a and 412 b, under-etching of first dielectric layer 422, second dielectric layer 424 and STI trench 408 may result in second top surface 426 b of STI trench 408 covering polysilicon residue portion 430, shown in more detail in FIG. 6C, and protecting polysilicon residue portion 430 during the polysilicon etch.

Indeed, it is believed that the height difference between first top surface 426 a of STI trench 408 and second top surface 426 b of STI trench 408 may be a be a primary reason for process-related device failures.

Thus, because of the very small window for the etching process for layers 408, 422 and 424, there is a tradeoff between over-etching, which may cause gouging of active area portion 428, and under-etching, which may result in polysilicon residue portion 430. Fabrication processes are described to reduce or eliminate such over-etching and under-etching.

Referring now to FIGS. 7A-7R, an example method of forming a peripheral region of a flash memory device is described. With reference to FIG. 7A, substrate 700 is shown as having already undergone several processing steps. Substrate 700 may be any suitable substrate such as a silicon, germanium, silicon-germanium, undoped, doped, bulk, silicon-on-insulator (“SOI”) or other substrate with or without additional circuitry. For example, substrate 700 may include one or more n-well or p-well regions (not shown).

Peripheral region gate oxide layer 702 is formed above substrate 700. In some embodiments, gate oxide layer 702 may be a layer of silicon dioxide, silicon nitride, silicon oxynitride or any other suitable insulating layer. Gate oxide layer 702 may be between about 30 angstroms and about 500 angstroms, although other thicknesses may be used.

Following formation of gate oxide layer 702, a semiconductor material layer 704 is deposited over gate oxide layer 702. In an embodiment, semiconductor material layer 704 is formed from a polycrystalline semiconductor material such as polysilicon, a polycrystalline silicon-germanium alloy, polygermanium or any other suitable material. Alternatively, semiconductor material layer 704 may be formed from a wide band-gap semiconductor material, such as ZnO, InGaZnO, or SiC, which may provide a high breakdown voltage, and typically may be used to provide junctionless FETs. Persons of ordinary skill in the art will understand that other materials may be used. For simplicity, semiconductor material layer 704 will be referred to herein as polysilicon layer 704.

In some embodiments, polysilicon layer 704 may be a heavily doped semiconductor material layer, such as n+ polysilicon. In some embodiments, n+ polysilicon layer 704 is in an amorphous state as deposited. In other embodiments, n+ polysilicon layer 704 is in a polycrystalline state as deposited. CVD or another suitable process may be employed to deposit n+ polysilicon layer 704.

In an example embodiment, n+ polysilicon layer 704 may be formed from about 100 to about 500 angstroms of phosphorus or arsenic doped silicon having a doping concentration of about 10²¹ cm⁻³. Other layer thicknesses, doping types and/or doping concentrations may be used. n+ polysilicon layer 704 may be doped in situ, for example, by flowing a donor gas during deposition. Other doping methods may be used (e.g., implantation).

Alternatively, polysilicon layer 704 may be p+ polysilicon. p+ polysilicon layer 704 may either be deposited and doped by ion implantation or may be doped in situ during deposition. For example, an intrinsic silicon layer may be deposited on gate oxide layer 702, and a blanket p-type implant may be employed to implant boron a predetermined depth within the intrinsic silicon layer. Example implantable molecular ions include BF₂, BF₃, B and the like. In some embodiments, an implant dose of about 1-10×10¹³ ions/cm² may be employed. Other implant species and/or doses may be used. Further, in some embodiments, a diffusion process may be employed. In at least one embodiment, the resultant p-type polysilicon layer 704 has a thickness of from about 100 to about 500 angstroms, although other p-type silicon layer thicknesses may be used.

A first dielectric material layer 706 is formed over polysilicon layer 704 to serve as a stop layer for CMP. For example, between about 100 angstroms to about 500 angstroms of silicon nitride may be deposited. Other CMP stop materials such as polysilicon and/or other material layer thicknesses may be used.

A second dielectric material layer 708 is formed over first dielectric material layer 706. For example, approximately 3000-7000 angstroms of silicon dioxide may be deposited over first dielectric material layer 706. Other materials such as polysilicon and silicon nitride, and/or other material layer thicknesses may be used.

Second dielectric material layer 708, first dielectric material layer 706 and polysilicon layer 704 are patterned and etched to form etched layer stacks 710 a, disposed over a first portion of substrate 700 that will become a peripheral transistor region 700 a, and 710 b, disposed over a second portion of substrate 700 that will become a peripheral capacitor region 700 b, resulting in the structure shown in FIG. 7B. Layer stack 710 a includes second dielectric material region 708 a, first dielectric material region 706 a and polysilicon region 704 a, and layer stack 710 b includes second dielectric material region 708 b, first dielectric material region 706 b and polysilicon region 704 b.

In an embodiment, second dielectric material layer 708, first dielectric material layer 706 and polysilicon layer 704 may be patterned and etched using conventional lithography techniques, with a soft or hard mask, and wet or dry etch processing. Second dielectric material layer 708, first dielectric material layer 706 and polysilicon layer 704 may be patterned and etched in a single pattern/etch procedure or using separate pattern/etch steps.

For example, photoresist (“PR”) may be deposited, patterned using standard photolithography techniques, layers 708, 706 and 704 may be etched, and then the PR may be removed. Alternatively, a hard mask of some other material, for example silicon dioxide, may be formed on top of second dielectric material layer 708, with bottom antireflective coating (“BARC”) on top, then patterned and etched. Similarly, dielectric antireflective coating (“DARC”) and/or amorphous carbon film (e.g., the Advanced Patterning Film from Applied Materials, Santa Clara, Calif.) may be used as a hard mask.

Any suitable masking and etching process may be used to form layer stacks 710 a and 710 b. For example, layers 708, 706 and 704 may be patterned with about 1 to about 1.5 micron, more preferably about 1.2 to about 1.4 micron, of PR using standard photolithographic techniques. Thinner PR layers may be used with smaller critical dimensions and technology nodes. In some embodiments, an oxide hard mask may be used below the PR layer to improve pattern transfer and protect underlying layers during etching.

In some embodiments, after etching, layer stacks 710 a and 710 b may be cleaned using a dilute hydrofluoric/sulfuric acid clean. Such cleaning may be performed in any suitable cleaning tool, such as a Raider tool, available from Semitool of Kalispell, Mont. Example post-etch cleaning may include using ultra-dilute sulfuric acid (e.g., about 1.5 1.8 wt %) for about 60 seconds and/or ultra-dilute hydrofluoric (“HF”) acid (e.g., about 0.4-0.6 wt %) for 60 seconds. Megasonics may or may not be used. Other clean chemistries, times and/or techniques may be employed.

A third dielectric layer 712 is deposited conformally over layer stacks 710 a and 710 b. For example, between about 50 angstroms to about 500 angstroms of silicon dioxide may be deposited, resulting in the structure illustrated in FIG. 7C. Other dielectric materials such as silicon nitride, silicon oxynitride, low K dielectrics, etc., and/or other dielectric material layer thicknesses may be used.

An anisotropic etch is used to remove lateral portions of third dielectric layer 712 and gate oxide layer 702, leaving only sidewall portion 712 a of third dielectric material on the sides of layers 708 a, 706 a, 704 a, and leaving only sidewall portion 712 b of third dielectric material on the sides of layers 708 b, 706 b, 704 b, resulting in the structure shown in FIG. 7D. Sidewall portions 712 a and 712 b form sidewall liners, and are referred to herein as sidewall liners 712 a and 712 b. In addition, the etch removes the lateral portion of gate oxide layer 702 between layer stacks 710 a and 710 b, exposing region 714 of substrate 700. As a result, layer stacks 710 a and 710 b include gate oxide regions 702 a and 702 b, respectively.

Region 714 of substrate 700 is isotopically etched to etch a first trench tab recess 716 a that extends under a first portion 718 a of gate oxide region 702 a, and a second trench tab recess 716 b that extends under a second portion 718 b of gate oxide region 702 b, resulting in the structure shown in FIG. 7E. First trench tab recess 716 a has a length Xa of between about 50 angstroms to about 500 angstroms, and second trench tab recess 716 b has a length Xb of between about 50 angstroms to about 500 angstroms, although other lengths may be used. First trench tab recess 716 a and second trench tab recess 716 b each have a height Ya of between about 50 angstroms to about 500 angstroms, although other heights may be used. As will be described in more detail below, first trench tab recess 716 a and second trench tab recess 716 b are used to form first and second dielectric tab extensions of an STI dielectric trench.

An RIE process is used to form a trench 716 c that extends vertically downward from first trench tab recess 716 a and second trench tab recess 716 b, resulting in the structure shown in FIG. 7F. Trench 76 may have a height Yb of between about 1000 angstroms and about 3000 angstroms, although other heights may be used.

A fourth dielectric material layer 720 is deposited conformally over layer stacks 710 a and 710 b. For example, between about 50 angstroms to about 500 angstroms of silicon dioxide may be deposited, resulting in the structure illustrated in FIG. 7G. Other dielectric materials such as silicon nitride, silicon oxynitride, low K dielectrics, etc., and/or other dielectric material layer thicknesses may be used. Fourth dielectric material layer 720 will be used to form a dielectric liner for a dielectric trench. Thus, fourth dielectric material layer 720 is also referred to herein as dielectric trench liner 720. As illustrated in FIG. 7G, dielectric trench liner 720 includes first dielectric trench tab extension 720 a and second dielectric trench tab extension 720 b formed in first trench tab recess 716 a and second trench tab recess 716 b, respectively. First dielectric trench tab extension 720 a has a length Xa and a height Ya, and second dielectric trench tab extension 720 b has a length Xb and a height Ya.

A fifth dielectric material layer 722 is deposited over substrate 700, filling trench 716 c. For example, approximately between about 3000 angstroms to about 10000 angstroms of silicon dioxide may be deposited on substrate 700, resulting in the structure shown in FIG. 7H. Other dielectric materials such as silicon nitride, silicon oxynitride, low K dielectrics, etc., and/or other dielectric material layer thicknesses may be used. Example low K dielectrics include carbon doped oxides, silicon carbon layers, or the like. Fifth dielectric material layer 722 will be used to form an STI dielectric trench. Thus, fifth dielectric material layer 722 is also referred to herein as dielectric trench 722.

Dielectric trench 722, dielectric trench liner 720, sidewall liners 712 a and 712 b, and second dielectric material regions 708 a and 708 b are planarized using chemical mechanical polishing or an etchback process to form a planar surface 724, resulting in the structure shown in FIG. 7I.

First dielectric material regions 706 a and 706 b, dielectric trench liner 720, and sidewall liners 712 a and 712 b are planarized using chemical mechanical polishing or an etchback process to form a planar surface 726, resulting in the structure shown in FIG. 7J.

The dielectric material for the peripheral region capacitors is deposited over substrate 700. The peripheral region capacitor dielectric may be a single layer of dielectric material, or may include multiple layers of dielectric material. In an example embodiment, a first capacitor dielectric material layer 728 is deposited over substrate 700, and a second capacitor dielectric material layer 730 is deposited on first capacitor dielectric material layer 728, resulting in the structure shown in FIG. 7K.

In an example embodiment, first capacitor dielectric material layer 728 may be between about 20 angstroms to about 200 angstroms of silicon dioxide, and second capacitor dielectric material layer 730 may be between about 20 angstroms to about 200 angstroms of HfSiO, although other dielectric materials and/or other dielectric material layer thicknesses may be used. In other embodiments, three, four or more capacitor dielectric materials may be stacked on one another.

As mentioned above, a portion of first capacitor dielectric material layer 728 and second capacitor dielectric material layer 730 may be removed from the portion over peripheral transistor region 700 a to avoid impurities from first capacitor dielectric material layer 728 and/or second capacitor dielectric material layer 730. In an embodiment, first capacitor dielectric material layer 728 and second capacitor dielectric material layer 730 may be patterned and etched using conventional lithography techniques, with a soft or hard mask, and wet or dry etch processing, resulting in the structure shown in FIG. 7L. First capacitor dielectric material layer 728 and second capacitor dielectric material layer 730 may be patterned and etched in a single pattern/etch procedure or using separate pattern/etch steps.

For example, PR may be deposited, patterned using standard photolithography techniques, layers 728 and 730 may be etched, and then the PR may be removed. Alternatively, a hard mask of some other material, for example silicon dioxide, may be formed on top of second capacitor dielectric material layer 730, with BARC on top, then patterned and etched. Similarly, DARC and/or amorphous carbon film may be used as a hard mask.

Any suitable masking and etching process may be used. For example, layers 728 and 730 may be patterned with about 1 to about 1.5 micron, more preferably about 1.2 to about 1.4 micron, of PR using standard photolithographic techniques. Thinner PR layers may be used with smaller critical dimensions and technology nodes. In some embodiments, an oxide hard mask may be used below the PR layer to improve pattern transfer and protect underlying layers during etching.

In some embodiments, after etching, layer 728 and 730 may be cleaned using a dilute hydrofluoric/sulfuric acid clean. Such cleaning may be performed in any suitable cleaning tool, such as a Raider tool, available from Semitool of Kalispell, Mont. Example post-etch cleaning may include using ultra-dilute sulfuric acid (e.g., about 1.5 1.8 wt %) for about 60 seconds and/or ultra-dilute HF acid (e.g., about 0.4-0.6 wt %) for 60 seconds. Megasonics may or may not be used. Other clean chemistries, times and/or techniques may be employed.

The material layers used to form gate contacts for transistors in peripheral transistor region 700 a, and top electrodes for capacitors in peripheral capacitor region 700 b are deposited over substrate 700. In an example embodiment, a conductive layer 732 is deposited over substrate 700. Conductive layer 732 may include any suitable conductive material such as tungsten/tungsten nitride or another appropriate metal, heavily doped semiconductor material, a conductive silicide, a conductive silicide-germanide, a conductive germanide, or the like deposited by any suitable method (e.g., CVD, PVD, etc.).

In at least one embodiment, conductive layer 732 may comprise between about 200 angstroms and about 1000 angstroms of tungsten/tungsten nitride. Other conductive layer materials and/or thicknesses may be used. In some embodiments, an adhesion layer, such as titanium nitride or other similar adhesion layer material, may be disposed between polysilicon region 704 a and second capacitor dielectric material layer 730 and conductive layer 732. In addition, in some embodiments, an adhesion layer 734, such as silicon nitride or other similar adhesion layer material, may be disposed on conductive layer 732. Persons of ordinary skill in the art will understand that adhesion layers may be formed by PVD or another method.

In an example embodiment, adhesion layer 734 is between about 50 angstroms and about 300 angstroms of silicon nitride. Other adhesion layer materials and/or thicknesses may be employed.

Following formation of conductive layer 732 and adhesion layer 734, a sixth dielectric material layer 736 is deposited over adhesion layer 734. For example, approximately 3000 7000 angstroms of silicon dioxide may be deposited on substrate 700, resulting in the structure shown in FIG. 7M. Other dielectric materials such as silicon nitride, silicon oxynitride, low K dielectrics, etc., and/or other dielectric material layer thicknesses may be used. Example low K dielectrics include carbon doped oxides, silicon carbon layers, or the like.

Sixth dielectric material layer 736 is then patterned and etched to form sixth dielectric material regions 736 a and 736 b. In an embodiment, sixth dielectric material layer 736 may be patterned and etched using conventional lithography techniques, with a soft or hard mask, and wet or dry etch processing, resulting in the structure shown in FIG. 7N.

For example, PR may be deposited, patterned using standard photolithography techniques, sixth dielectric material layer 736 may be etched, and then the PR may be removed. Alternatively, a hard mask of some other material, for example silicon dioxide, may be formed on top of sixth dielectric material layer 736, with BARC on top, then patterned and etched. Similarly, DARC and/or amorphous carbon film may be used as a hard mask.

Any suitable masking and etching process may be used. For example, sixth dielectric material layer 736 may be patterned with about 1 to about 1.5 micron, more preferably about 1.2 to about 1.4 micron, of PR using standard photolithographic techniques. Thinner PR layers may be used with smaller critical dimensions and technology nodes. In some embodiments, an oxide hard mask may be used below the PR layer to improve pattern transfer and protect underlying layers during etching.

In some embodiments, after etching, sixth dielectric material layer 736 may be cleaned using a dilute hydrofluoric/sulfuric acid clean. Such cleaning may be performed in any suitable cleaning tool, such as a Raider tool, available from Semitool of Kalispell, Mont. Example post-etch cleaning may include using ultra-dilute sulfuric acid (e.g., about 1.5 1.8 wt %) for about 60 seconds and/or ultra-dilute HF acid (e.g., about 0.4-0.6 wt %) for 60 seconds. Megasonics may or may not be used. Other clean chemistries, times and/or techniques may be employed.

A dielectric liner 738 is deposited conformally over sixth dielectric material regions 736 a and 736 b, and adhesion layer 734. For example, between about 20 angstroms to about 500 angstroms of silicon dioxide may be deposited, resulting in the structure illustrated in FIG. 7O. Other dielectric materials such as silicon nitride, silicon oxynitride, low K dielectrics, etc., and/or other dielectric material layer thicknesses may be used. In some embodiments, dielectric liner 738 can be omitted.

An anisotropic etch is used to remove lateral portions of dielectric liner 738, leaving only sidewall portions 738 a and 738 b of dielectric liner material on the sides of sixth dielectric material regions 736 a and 736 b, respectively. In addition, the etch removes lateral portions of adhesion layer 734 and conductive layer 732, leaving conductive layer regions 732 a and 732 b, and adhesion layer regions 734 a and 734 b between sixth dielectric material regions 736 a and 736 b, respectively. The etch exposes a portion of polysilicon region 704 a, top portions of third dielectric material sidewall portion 712 a, dielectric trench liner 720, and portions of dielectric trench 722, first capacitor dielectric material layer 728 and second capacitor dielectric material layer 730, resulting in the structure shown in FIG. 7P.

Next, an anisotropic etch is used to remove lateral portions of second capacitor dielectric material layer 730, first capacitor dielectric material layer 728, dielectric trench liner 720, third dielectric material sidewall portions 712 a and 712 b and a portion of dielectric trench 722. The etch exposes edges 740 a and 740 b of gate oxide regions 702 a and 702 b, respectively, edges 742 a and 742 b of dielectric trench liner 720, and a top surface of dielectric trench 722, resulting in the structure shown in FIG. 7Q. The remaining (unetched) portion of dielectric trench liner 720 are labeled 720 c, and the remaining (unetched) portion of dielectric trench 722 is labeled 722 c. As illustrated in FIG. 7Q, the etch may cause the top surface of dielectric trench 722 c to be lower in peripheral transistor region 700 a than in peripheral capacitor region 700 b.

In the structure of FIG. 7Q, first dielectric trench tab extension 720 a and second dielectric trench tab extension 720 b, dielectric trench liner 720 c and dielectric trench 722 c collectively form an STI trench 744, shown in cross-hatch. STI trench 744 includes first dielectric trench tab extension 720 a and second dielectric trench tab extension 720 b that are disposed at a top portion of STI trench 744. In an example embodiment, first dielectric trench tab extension 720 a extends in a first direction from STI trench 744 (e.g., in a negative x-direction), and second dielectric trench tab extension 720 b extends in a second direction (e.g., in a positive x-direction) from STI trench 744. In an example embodiment, first dielectric trench tab extension 720 a and second dielectric trench tab extension 720 b extend substantially horizontally outward from STI trench 744.

Without wanting to be bound by any particular theory, it is believed that first dielectric trench tab extension 720 a and second dielectric trench tab extension 720 b may prevent gouging of active area portion 746 of peripheral transistor region 700 a.

Finally, polysilicon regions 704 a and 704 b are etched back to form transistor gate 704 a 1 and a capacitor bottom plate 704 b 1, respectively, resulting in the structure shown in FIG. 7R. Without wanting to be bound by any particular theory, it is believed that first dielectric trench tab extension 720 a and second dielectric trench tab extension 720 b may prevent polysilicon residue forming in region 748 as a result of under-etching of capacitor bottom plate 704 b 1.

In particular, it is believed that the presence of first dielectric trench tab extension 720 a may allow more time for etching layers 722, 728 and 730 without exposing active area portion 746 of peripheral transistor region 700 a, and may prevent gouging of the substrate (such as gouging of an active area portion 428 of peripheral transistor region 404 shown in FIG. 6B) during the etch of polysilicon regions 704 a and 704 b. As a result of this additional etch time, it is believed that a top portion 750 of STI trench 744 will not exceed a height of gate oxide region 702 b, and thus prevent polysilicon residue portions forming (such as polysilicon residue portion 430 shown in FIG. 6B).

As described above in connection with FIGS. 6A-6C, it is believed that the height difference between first top surface 426 a of STI trench 408 adjacent peripheral transistor region 404 and second top surface 426 b of STI trench 408 adjacent peripheral capacitor region 406 may cause active area gouging (over etching) and polysilicon residue (under etching) device failures. Technology is described to substantially eliminate the height difference between the top portions of STI trenches.

In particular, referring now to FIGS. 8A-8P1, an example method of forming a peripheral transistor region and a peripheral capacitor of a flash memory device is described. With reference to FIG. 8A, substrate 800 is shown as having already undergone several processing steps. Substrate 800 may be any suitable substrate such as a silicon, germanium, silicon-germanium, undoped, doped, bulk, SOI or other substrate with or without additional circuitry. For example, substrate 800 may include one or more n-well or p-well regions (not shown).

Peripheral region gate oxide layer 802 is formed above substrate 800. In some embodiments, gate oxide layer 802 may be a layer of silicon dioxide, silicon nitride, silicon oxynitride or any other suitable insulating layer. Gate oxide layer 802 may be between about 30 angstroms and about 500 angstroms, although other thicknesses may be used.

Following formation of gate oxide layer 802, a semiconductor material layer 804 is deposited over gate oxide layer 802. In an embodiment, semiconductor material layer 804 is formed from a polycrystalline semiconductor material such as polysilicon, a polycrystalline silicon-germanium alloy, polygermanium or any other suitable material. Alternatively, semiconductor material layer 804 may be formed from a wide band-gap semiconductor material, such as ZnO, InGaZnO, or SiC, which may provide a high breakdown voltage, and typically may be used to provide junctionless FETs. Persons of ordinary skill in the art will understand that other materials may be used. For simplicity, semiconductor material layer 804 will be referred to herein as polysilicon layer 804.

In some embodiments, polysilicon layer 804 may be a heavily doped semiconductor material layer, such as n+ polysilicon. In some embodiments, n+ polysilicon layer 804 is in an amorphous state as deposited. In other embodiments, n+ polysilicon layer 804 is in a polycrystalline state as deposited. CVD or another suitable process may be employed to deposit n+ polysilicon layer 804.

In an example embodiment, n+ polysilicon layer 804 may be formed from about 100 to about 500 angstroms of phosphorus or arsenic doped silicon having a doping concentration of about 10²¹ cm⁻³. Other layer thicknesses, doping types and/or doping concentrations may be used. n+ polysilicon layer 804 may be doped in situ, for example, by flowing a donor gas during deposition. Other doping methods may be used (e.g., implantation).

Alternatively, polysilicon layer 804 may be p+ polysilicon. p+ polysilicon layer 804 may either be deposited and doped by ion implantation or may be doped in situ during deposition. For example, an intrinsic silicon layer may be deposited on gate oxide layer 802, and a blanket p-type implant may be employed to implant boron a predetermined depth within the intrinsic silicon layer. Example implantable molecular ions include BF₂, BF₃, B and the like. In some embodiments, an implant dose of about 1-10×10¹³ ions/cm² may be employed. Other implant species and/or doses may be used. Further, in some embodiments, a diffusion process may be employed. In at least one embodiment, the resultant p-type polysilicon layer 804 has a thickness of from about 100 to about 500 angstroms, although other p-type silicon layer thicknesses may be used.

A first dielectric material layer 806 is formed over polysilicon layer 804 to serve as a stop layer for CMP. For example, between about 100 angstroms to about 500 angstroms of silicon nitride may be deposited. Other CMP stop materials such as polysilicon and/or other material layer thicknesses may be used.

A second dielectric material layer 808 is formed over first dielectric material layer 806. For example, approximately 3000-7000 angstroms of silicon dioxide may be deposited over first dielectric material layer 806. Other materials such as polysilicon and silicon nitride, and/or other material layer thicknesses may be used.

Second dielectric material layer 808, first dielectric material layer 806 and polysilicon layer 804 are patterned and etched to form etched layer stacks 810 a, disposed over a first portion of substrate 800 that will become a peripheral transistor region 800 a, and 810 b, disposed over a second portion of substrate 800 that will become a peripheral capacitor region 800 b, resulting in the structure shown in FIG. 8B. Layer stack 810 a includes second dielectric material region 808 a, first dielectric material region 806 a and polysilicon region 804 a, and layer stack 810 b includes second dielectric material region 808 b, first dielectric material region 806 b and polysilicon region 804 b.

In an embodiment, second dielectric material layer 808, first dielectric material layer 806 and polysilicon layer 804 may be patterned and etched using conventional lithography techniques, with a soft or hard mask, and wet or dry etch processing. Second dielectric material layer 808, first dielectric material layer 806 and polysilicon layer 804 may be patterned and etched in a single pattern/etch procedure or using separate pattern/etch steps.

For example, PR may be deposited, patterned using standard photolithography techniques, layers 808, 806 and 804 may be etched, and then the PR may be removed. Alternatively, a hard mask of some other material, for example silicon dioxide, may be formed on top of second dielectric material layer 808, with BARC on top, then patterned and etched. Similarly, DARC and/or amorphous carbon film (e.g., the Advanced Patterning Film from Applied Materials, Santa Clara, Calif.) may be used as a hard mask.

Any suitable masking and etching process may be used to form layer stacks 810 a and 810 b. For example, layers 808, 806 and 804 may be patterned with about 1 to about 1.5 micron, more preferably about 1.2 to about 1.4 micron, of PR using standard photolithographic techniques. Thinner PR layers may be used with smaller critical dimensions and technology nodes. In some embodiments, an oxide hard mask may be used below the PR layer to improve pattern transfer and protect underlying layers during etching.

In some embodiments, after etching, layer stacks 810 a and 810 b may be cleaned using a dilute hydrofluoric/sulfuric acid clean. Such cleaning may be performed in any suitable cleaning tool, such as a Raider tool, available from Semitool of Kalispell, Mont. Example post-etch cleaning may include using ultra-dilute sulfuric acid (e.g., about 1.5 1.8 wt %) for about 60 seconds and/or ultra-dilute HF acid (e.g., about 0.4-0.6 wt %) for 60 seconds. Megasonics may or may not be used. Other clean chemistries, times and/or techniques may be employed.

An anisotropic etch is used to remove a portion of gate oxide layer 802 between layer stacks 810 a and 810 b, resulting in the structure shown in FIG. 8C. The etch exposes region 812 of substrate 800. As a result, layer stacks 810 a and 810 b include gate oxide regions 802 a and 802 b, respectively.

An RIE process is used to anisotopically etch region 812 of substrate 800, to form a trench 814 that extends vertically downward from region 812, resulting in the structure shown in FIG. 8D. Trench 814 may have a height Y of between about 1000 angstroms and about 3000 angstroms, although other heights may be used.

A third dielectric material layer 816 is deposited over substrate 800, filling trench 814. For example, approximately between about 3000 angstroms to about 10000 angstroms of silicon dioxide may be deposited on substrate 800, resulting in the structure shown in FIG. 8E. Other dielectric materials such as silicon nitride, silicon oxynitride, low K dielectrics, etc., and/or other dielectric material layer thicknesses may be used. Example low K dielectrics include carbon doped oxides, silicon carbon layers, or the like. Third dielectric material layer 816 will be used to form an STI dielectric trench. Thus, third dielectric material layer 816 is also referred to herein as dielectric trench 816.

Dielectric trench 816, second dielectric material regions 808 a and 808 b are planarized using chemical mechanical polishing or an etchback process to form a planar surface 818, resulting in the structure shown in FIG. 8F.

First dielectric material regions 806 a and 806 b, and dielectric trench 816 are planarized using chemical mechanical polishing or an etchback process to form a planar surface 820, resulting in the structure shown in FIG. 8G.

The dielectric material for the peripheral region capacitors is deposited over substrate 800. The peripheral region capacitor dielectric may be a single layer of dielectric material, or may include multiple layers of dielectric material. In an example embodiment, a first capacitor dielectric material layer 822 is deposited over substrate 800, and a second capacitor dielectric material layer 824 is deposited on first capacitor dielectric material layer 822, resulting in the structure shown in FIG. 8H.

In an example embodiment, first capacitor dielectric material layer 822 may be between about 20 angstroms to about 200 angstroms of silicon dioxide, and second capacitor dielectric material layer 824 may be between about 20 angstroms to about 200 angstroms of HfSiO, although other dielectric materials and/or other dielectric material layer thicknesses may be used. In other embodiments, three, four or more capacitor dielectric materials may be stacked on one another.

As mentioned above, a portion of first capacitor dielectric material layer 822 and second capacitor dielectric material layer 824 may be removed from the portion over peripheral transistor region 800 a to avoid impurities from first capacitor dielectric material layer 822 and/or second capacitor dielectric material layer 824. In an embodiment, first capacitor dielectric material layer 822 and second capacitor dielectric material layer 824 may be patterned and etched using conventional lithography techniques, with a soft or hard mask, and wet or dry etch processing, resulting in the structure shown in FIG. 8I. First capacitor dielectric material layer 822 and second capacitor dielectric material layer 824 may be patterned and etched in a single pattern/etch procedure or using separate pattern/etch steps.

For example, PR may be deposited, patterned using standard photolithography techniques, layers 822 and 824 may be etched, and then the PR may be removed. Alternatively, a hard mask of some other material, for example silicon dioxide, may be formed on top of second capacitor dielectric material layer 824, with BARC on top, then patterned and etched. Similarly, DARC and/or amorphous carbon film may be used as a hard mask.

Any suitable masking and etching process may be used. For example, layers 822 and 824 may be patterned with about 1 to about 1.5 micron, more preferably about 1.2 to about 1.4 micron, of PR using standard photolithographic techniques. Thinner PR layers may be used with smaller critical dimensions and technology nodes. In some embodiments, an oxide hard mask may be used below the PR layer to improve pattern transfer and protect underlying layers during etching.

In some embodiments, after etching, layers 822 and 824 may be cleaned using a dilute hydrofluoric/sulfuric acid clean. Such cleaning may be performed in any suitable cleaning tool, such as a Raider tool, available from Semitool of Kalispell, Mont. Example post-etch cleaning may include using ultra-dilute sulfuric acid (e.g., about 1.5 1.8 wt %) for about 60 seconds and/or ultra-dilute HF acid (e.g., about 0.4-0.6 wt %) for 60 seconds. Megasonics may or may not be used. Other clean chemistries, times and/or techniques may be employed.

The material layers used to form gate contacts for transistors in peripheral transistor region 800 a, and top electrodes for capacitors in peripheral capacitor region 800 b are deposited over substrate 800. In an example embodiment, a conductive layer 826 is deposited over substrate 800. Conductive layer 826 may include any suitable conductive material such as tungsten/tungsten nitride or another appropriate metal, heavily doped semiconductor material, a conductive silicide, a conductive silicide-germanide, a conductive germanide, or the like deposited by any suitable method (e.g., CVD, PVD, etc.).

In at least one embodiment, conductive layer 826 may comprise between about 200 angstroms and about 1000 angstroms of tungsten/tungsten nitride. Other conductive layer materials and/or thicknesses may be used. In some embodiments, an adhesion layer, such as titanium nitride or other similar adhesion layer material, may be disposed between polysilicon region 804 a and second capacitor dielectric material layer 824 and conductive layer 826. In addition, in some embodiments, an adhesion layer 828, such as silicon nitride or other similar adhesion layer material, may be disposed on conductive layer 826. Persons of ordinary skill in the art will understand that adhesion layers may be formed by PVD or another method.

In an example embodiment, adhesion layer 828 is between about 50 angstroms and about 300 angstroms of silicon nitride. Other adhesion layer materials and/or thicknesses may be employed.

Following formation of conductive layer 826 and adhesion layer 828, a fourth dielectric material layer 830 is deposited over adhesion layer 828. For example, approximately 3000 7000 angstroms of silicon dioxide may be deposited on substrate 800, resulting in the structure shown in FIG. 8J. Other dielectric materials such as silicon nitride, silicon oxynitride, low K dielectrics, etc., and/or other dielectric material layer thicknesses may be used. Example low K dielectrics include carbon doped oxides, silicon carbon layers, or the like.

Fourth dielectric material layer 830 and adhesion layer 828 are patterned and etched to form fourth dielectric material regions 830 a, 830 b and 830 c, and adhesion layer regions 828 a, 828 b and 828 c. In an embodiment, fourth dielectric material layer 830 and adhesion layer 828 may be patterned and etched using conventional lithography techniques, with a soft or hard mask, and wet or dry etch processing, resulting in the structure shown in FIG. 8K1.

For example, PR may be deposited, patterned using standard photolithography techniques, fourth dielectric material layer 830 and adhesion layer 828 may be etched, and then the PR may be removed. Alternatively, a hard mask of some other material, for example silicon dioxide, may be formed on top of fourth dielectric material layer 830 and adhesion layer 828, with BARC on top, then patterned and etched. Similarly, DARC and/or amorphous carbon film may be used as a hard mask.

Any suitable masking and etching process may be used. For example, fourth dielectric material layer 830 and adhesion layer 828 may be patterned with about 1 to about 1.5 micron, more preferably about 1.2 to about 1.4 micron, of PR using standard photolithographic techniques. Thinner PR layers may be used with smaller critical dimensions and technology nodes. In some embodiments, an oxide hard mask may be used below the PR layer to improve pattern transfer and protect underlying layers during etching.

In some embodiments, after etching, fourth dielectric material layer 830 and adhesion layer 828 may be cleaned using a dilute hydrofluoric/sulfuric acid clean. Such cleaning may be performed in any suitable cleaning tool, such as a Raider tool, available from Semitool of Kalispell, Mont. Example post-etch cleaning may include using ultra-dilute sulfuric acid (e.g., about 1.5 1.8 wt %) for about 60 seconds and/or ultra-dilute HF acid (e.g., about 0.4-0.6 wt %) for 60 seconds. Megasonics may or may not be used. Other clean chemistries, times and/or techniques may be employed.

A dielectric liner 832 a is deposited conformally over fourth dielectric material regions 830 a, 830 b and 830 c, and adhesion layer regions 828 a, 828 b and 828 c. For example, between about 20 angstroms to about 500 angstroms of silicon dioxide may be deposited, resulting in the structure illustrated in FIG. 8L1. Other dielectric materials such as silicon nitride, silicon oxynitride, low K dielectrics, etc., and/or other dielectric material layer thicknesses may be used. In some embodiments, dielectric liner 832 a can be omitted.

An RIE process is used to anisotopically etch dielectric liner 832 a, conductive layer 826, second capacitor dielectric material layer 824, first capacitor dielectric material layer 822, and dielectric trench 816, resulting in the structure shown in FIG. 8M1. Dielectric trench 816 has a first top surface 834 a adjacent peripheral transistor region 800 a and a second top surface 834 b adjacent peripheral capacitor region 800 b. Second top surface 834 b adjacent peripheral capacitor region 800 b is higher than first top surface 834 a adjacent peripheral transistor region 800 a.

PR layer 836 a is deposited over substrate 800. For example, about 1 to about 1.5 micron, more preferably about 1.2 to about 1.4 micron, of PR layer 836 a may be deposited over substrate 800 using standard photolithographic techniques. Thinner PR layers may be used with smaller critical dimensions and technology nodes. In some embodiments, an oxide hard mask may be used below PR layer 836 a to improve pattern transfer and protect underlying layers during etching. PR layer 836 a is patterned using standard photolithography techniques, to remove portions of PR layer 836 a from peripheral capacitor region 800 b, while leaving the portion of PR layer 836 a over peripheral transistor region 800 a, resulting in the structure shown in FIG. 8N1.

Dielectric trench 816 and fourth dielectric material regions 830 b and 830 c are then etched to reduce the height of second top surface 834 b of dielectric trench 816. In an embodiment, second top surface 834 b is etched so that a difference between a height of second top surface 834 b′ adjacent peripheral capacitor region 800 b and a height of first top surface 834 a adjacent peripheral transistor region 800 a is less than a predetermined value Δ_(MAX). In an embodiment, Δ_(MAX) is about 30 nm, although other values of Δ_(MAX) may be used.

In another embodiment, second top surface 834 b′ adjacent peripheral capacitor region 800 b has a height that is substantially equal to a height of first top surface 834 a adjacent peripheral transistor region 800 a. In still another embodiment, second top surface 834 b′ adjacent peripheral capacitor region 800 b is substantially coplanar with first top surface 834 a adjacent peripheral transistor region 800 a. Following etching, PR layer 836 a is removed, resulting in the structure of FIG. 801.

Finally, polysilicon regions 804 a and 804 b are etched back to form transistor gate 804 a 1 and a capacitor bottom plate 804 b 1, respectively, resulting in the structure shown in FIG. 8P1. Without wanting to be bound by any particular theory, it is believed that making a difference between a height of second top surface 834 b′ adjacent peripheral capacitor region 800 b and a height of first top surface 834 a adjacent peripheral transistor region 800 a less than a predetermined value Δ_(MAX) may prevent polysilicon residue forming in region 838 as a result of under-etching of capacitor bottom plate 804 b 1.

In particular, it is believed that the process of FIGS. 8A-8J and 8K1-8P1 allows polysilicon regions 804 a and 804 b to be etched without exposing active area portion 840 of peripheral transistor region 800 a, and may prevent gouging of the substrate (such as gouging of an active area portion 428 of peripheral transistor region 404 shown in FIG. 6B) during the etch of polysilicon regions 804 a and 804 b.

FIGS. 8K2-8P2 illustrate an alternative method of forming a peripheral region of a flash memory device. The processing steps illustrated in FIGS. 8K2-8P2 follow the steps illustrated in FIGS. 8A-8J, and thus may be used as an alternative to the steps illustrated in FIGS. 8K1-8P1.

Beginning with the structure illustrated in FIG. 8J, fourth dielectric material layer 830, adhesion layer 828 and conductive layer 826 are patterned and etched to form fourth dielectric material regions 830 a, 830 b and 830 c, adhesion layer regions 828 a, 828 b and 828 c, and conductive layer regions 826 a, 826 b and 826 c. In an embodiment, fourth dielectric material layer 830, adhesion layer 828 and conductive layer 826 may be patterned and etched using conventional lithography techniques, with a soft or hard mask, and wet or dry etch processing, resulting in the structure shown in FIG. 8K2.

For example, PR may be deposited, patterned using standard photolithography techniques, fourth dielectric material layer 830, adhesion layer 828 and conductive layer 826 may be etched, and then the PR may be removed. Alternatively, a hard mask of some other material, for example silicon dioxide, may be formed on top of fourth dielectric material layer 830, adhesion layer 828 and conductive layer 826, with BARC on top, then patterned and etched. Similarly, DARC and/or amorphous carbon film may be used as a hard mask.

Any suitable masking and etching process may be used. For example, fourth dielectric material layer 830, adhesion layer 828 and conductive layer 826 may be patterned with about 1 to about 1.5 micron, more preferably about 1.2 to about 1.4 micron, of PR using standard photolithographic techniques. Thinner PR layers may be used with smaller critical dimensions and technology nodes. In some embodiments, an oxide hard mask may be used below the PR layer to improve pattern transfer and protect underlying layers during etching.

In some embodiments, after etching, fourth dielectric material layer 830, adhesion layer 828 and conductive layer 826 may be cleaned using a dilute hydrofluoric/sulfuric acid clean. Such cleaning may be performed in any suitable cleaning tool, such as a Raider tool, available from Semitool of Kalispell, Mont. Example post-etch cleaning may include using ultra-dilute sulfuric acid (e.g., about 1.5 1.8 wt %) for about 60 seconds and/or ultra-dilute HF acid (e.g., about 0.4-0.6 wt %) for 60 seconds. Megasonics may or may not be used. Other clean chemistries, times and/or techniques may be employed.

A dielectric liner 832 b is deposited conformally over fourth dielectric material regions 830 a, 830 b and 830 c, adhesion layer regions 828 a, 828 b and 828 c, conductive layer regions 826 a, 826 b and 826 c, polysilicon region 804 a, dielectric trench 816, and second capacitor dielectric material layer 824. For example, between about 20 angstroms to about 500 angstroms of silicon dioxide may be deposited, resulting in the structure illustrated in FIG. 8L2. Other dielectric materials such as silicon nitride, silicon oxynitride, low K dielectrics, etc., and/or other dielectric material layer thicknesses may be used. In some embodiments, dielectric liner 832 b can be omitted.

PR layer 836 b is deposited over substrate 800. For example, about 1 to about 1.5 micron, more preferably about 1.2 to about 1.4 micron, of PR layer 836 b may be deposited over substrate 800 using standard photolithographic techniques. Thinner PR layers may be used with smaller critical dimensions and technology nodes. In some embodiments, an oxide hard mask may be used below PR layer 836 b to improve pattern transfer and protect underlying layers during etching. PR layer 836 b is patterned using standard photolithography techniques, to remove portions of PR layer 836 b from peripheral capacitor region 800 b, while leaving the portion of PR layer 836 b over peripheral transistor region 800 a, resulting in the structure shown in FIG. 8M2.

Dielectric liner 832 b, fourth dielectric material regions 830 b and 830 c, second capacitor dielectric material layer 824 and first capacitor dielectric material layer 822 are etched to expose a surface of dielectric trench 816 and polysilicon region 804 b, resulting in the structure of FIG. 8N2. Dielectric trench 816 has a first top surface 842 a and a second top surface 842 b, with second top surface 842 b at substantially the same height as first top surface 842 a.

Dielectric liner 832 b, fourth dielectric material regions 830 a, 830 b and 830 c and dielectric trench 816 are etched, resulting in the structure shown in FIG. 802. Dielectric trench 816 has a first top surface 842 a′ adjacent peripheral transistor region 800 a and a second top surface 842 b′ adjacent peripheral capacitor region 800 b.

In an embodiment, a difference between a height of second top surface 842 b′ adjacent peripheral capacitor region 800 b and a height of first top surface 842 a′ adjacent peripheral transistor region 800 a is less than a predetermined value Δ_(MAX). In an embodiment, Δ_(MAX) is about 30 nm, although other values of AMAX may be used.

In another embodiment, second top surface 842 b′ adjacent peripheral capacitor region 800 b has a height that is substantially equal to a height of first top surface 842 a′ adjacent peripheral transistor region 800 a. In still another embodiment, second top surface 842 b′ adjacent peripheral capacitor region 800 b is substantially coplanar with first top surface 842 a′ adjacent peripheral transistor region 800 a.

Finally, polysilicon regions 804 a and 804 b are etched back to form transistor gate 804 a 1 and a capacitor bottom plate 804 b 1, respectively, resulting in the structure shown in FIG. 8P2. Without wanting to be bound by any particular theory, it is believed that making a difference between a height of second top surface 842 b′ adjacent peripheral capacitor region 800 b and a height of first top surface 842 a′ adjacent peripheral transistor region 800 a less than a predetermined value Δ_(MAX) may prevent polysilicon residue forming in region 844 as a result of under-etching of capacitor bottom plate 804 b 1.

In particular, it is believed that the process of FIGS. 8A-8J and 8K2-8P2 allows polysilicon regions 804 a and 804 b to be etched without exposing active area portion 840 of peripheral transistor region 800 a, and may prevent gouging of the substrate (such as gouging of an active area portion 428 of peripheral transistor region 404 shown in FIG. 6B) during the etch of polysilicon regions 804 a and 804 b.

FIG. 9 illustrates a non-volatile storage device 1010 that may include one or more memory die or chips 1012. Memory die 1012 includes an array (two-dimensional or three dimensional) of memory cells 1000, control circuitry 1020, and read/write circuits 1030A and 1030B. In one embodiment, access to the memory array 1000 by the various peripheral circuits is implemented in a symmetric fashion, on opposite sides of the array, so that the densities of access lines and circuitry on each side are reduced by half. The read/write circuits 1030A and 1030B include multiple sense blocks 1300 which allow a page of memory cells to be read or programmed in parallel. The memory array 1000 is addressable by word lines via row decoders 1040A and 1040B and by bit lines via column decoders 1042A and 1042B. In a typical embodiment, a controller 1044 is included in the same memory device 1010 (e.g., a removable storage card or package) as the one or more memory die 1012. Commands and data are transferred between the host and controller 1044 via lines 1032 and between the controller and the one or more memory die 1012 via lines 1034. One implementation can include multiple chips 1012.

Control circuitry 1020 cooperates with the read/write circuits 1030A and 1030B to perform memory operations on the memory array 1000. The control circuitry 1020 includes a state machine 1022, an on-chip address decoder 1024 and a power control module 1026. The state machine 1022 provides chip-level control of memory operations. The on-chip address decoder 1024 provides an address interface to convert between the address that is used by the host or a memory controller to the hardware address used by the decoders 1040A, 1040B, 1042A, and 1042B. The power control module 1026 controls the power and voltages supplied to the word lines and bit lines during memory operations. In one embodiment, power control module 1026 includes one or more charge pumps that can create voltages larger than the supply voltage.

In one embodiment, one or any combination of control circuitry 1020, power control circuit 1026, decoder circuit 1024, state machine circuit 1022, decoder circuit 1042A, decoder circuit 1042B, decoder circuit 1040A, decoder circuit 1040B, read/write circuits 1030A, read/write circuits 1030B, and/or controller 1044 can be referred to as one or more managing circuits.

In one embodiment, an array of memory cells 1000 is divided into a large number of blocks (e.g., blocks 0-1023, or another amount) of memory cells. As is common for flash EEPROM systems, the block is the unit of erase. That is, each block contains the minimum number of memory cells that are erased together. Other units of erase can also be used. A block contains a set of NAND strings which are accessed via bit lines and word lines. Typically, all of the NAND strings in a block share a common set of word lines.

Each block is typically divided into a number of pages. In one embodiment, a page is a unit of programming. Other units of programming can also be used. One or more pages of data are typically stored in one row of memory cells. For example, one or more pages of data may be stored in memory cells connected to a common word line. Thus, in one embodiment, the set of memory cells that are connected to a common word line are programmed simultaneously. A page can store one or more sectors. A sector includes user data and overhead data (also called system data). Overhead data typically includes header information and Error Correction Codes (ECC) that have been calculated from the user data of the sector. The controller (or other component) calculates the ECC when data is being programmed into the array, and also checks it when data is being read from the array. Alternatively, the ECCs and/or other overhead data are stored in different pages, or even different blocks, than the user data to which they pertain. A sector of user data is typically 512 bytes, corresponding to the size of a sector in magnetic disk drives. A large number of pages form a block, anywhere from 8 pages, for example, up to 32, 64, 128 or more pages. Different sized blocks, pages and sectors can also be used.

Various features and techniques have been presented with respect to the NAND flash memory architecture. It will be appreciated from the provided disclosure that implementations of the disclosed technology are not so limited. By way of non-limiting example, embodiments in accordance with the present disclosure can provide and be used in the fabrication of a wide range of semiconductor devices, including but not limited to logic arrays, volatile memory arrays including SRAM and DRAM, and non-volatile memory arrays including both the NOR and NAND architecture.

One embodiment includes a NAND memory that includes a memory cell region and a peripheral region. The peripheral region includes a shallow trench isolation trench disposed in a substrate. The shallow trench isolation trench includes a first top surface, and a second top surface. A difference between a height of the second top surface and a height of the first top surface is less than a predetermined value Δ_(MAX).

One embodiment includes a method of forming a NAND memory array. The method includes forming a memory cell region in a substrate, forming a peripheral region in the substrate adjacent the memory cell region, and forming a shallow trench isolation trench in the substrate in the peripheral region by forming a first top surface of the shallow trench isolation trench, and forming a second top surface of the shallow trench isolation trench. A difference between a height of the second top surface and a height of the first top surface is less than a predetermined value ΔMAX.

One embodiment includes a method of forming a shallow trench isolation trench in a substrate of a peripheral region of a NAND memory. The method includes forming dielectric material layer on the substrate, patterning and etching the dielectric material layer to have a first top surface and a second top surface, the first top surface lower than the second top surface, and patterning and etching the dielectric material layer to lower the second top surface so that a difference between a height of the second top surface and a height of the first top surface is less than a predetermined value Δ_(MAX). The dielectric material layer comprises the shallow trench isolation trench

The foregoing detailed description has been presented for purposes of illustration and description. It is not intended to be exhaustive or to limit the subject matter claimed herein to the precise form(s) disclosed. Many modifications and variations are possible in light of the above teachings. The described embodiments were chosen in order to best explain the principles of the disclosed technology and its practical application to thereby enable others skilled in the art to best utilize the technology in various embodiments and with various modifications as are suited to the particular use contemplated. It is intended that the scope of the invention be defined by the claims appended hereto. 

The invention claimed is:
 1. A method of forming a shallow trench isolation trench in a substrate of a peripheral region of a NAND memory, the method comprising: forming dielectric material layer on the substrate; patterning and etching the dielectric material layer to have a first top surface and a second top surface, the first top surface lower than the second top surface; patterning and etching the dielectric material layer to lower the second top surface so that a difference between a height of the second top surface and a height of the first top surface is less than a predetermined value ΔMAX, wherein the dielectric material layer comprises the shallow trench isolation trench, wherein the peripheral region comprises a peripheral transistor region and a peripheral capacitor region; and forming the shallow trench isolation trench comprises forming the first top surface adjacent the peripheral transistor region and forming the second top surface adjacent the peripheral capacitor region.
 2. The method of claim 1, wherein Δ_(MAX) is about 30 nm.
 3. The method of claim 1, wherein forming the shallow trench isolation trench comprises forming the height of the second top surface substantially equal to the height of the first top surface.
 4. The method of claim 1, wherein forming the shallow trench isolation trench comprises forming the first top surface substantially coplanar with the second top surface.
 5. The method of claim 1, wherein the shallow trench isolation trench comprises one or more of silicon dioxide, silicon nitride, silicon oxynitride, and low K dielectrics. 